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CVD Carbon Thermal Film

CVD Carbon Thermal Film

Thermal conductivity: 2000-2300 W/m·K. Ideal for AI chip near-junction cooling, high-end laser optical windows, 5G millimeter-wave high-frequency device substrates, and quantum computing chip packaging.

Material

CVD Carbon

Application Areas

AI chip near-junction thermal management, high-end laser optical windows, 5G mmWave high-frequency device substrates, and quantum computing chip packaging

Product Features

  • Ultra-high thermal conductivity, thin and lightweight, flexible, excellent chemical stability
Get in touch

Contact Us

Company Address: Building L, High-tech Science Park, Huan Guan Nan Road, Guanlan Street, Longhua New District, Shenzhen

Factory Address: No. 47 Dongxing Avenue, Zhongkai High-tech Industrial Development Zone, Huicheng District, Huizhou City

Contact: Engineer Zhou 13510102777

Shenzhen phone: 0755-83953353

National Hotline: 400-777-8111

emi@emc.tw

About Us

Shenzhen Puliant Electronic Technology Co., Ltd. specializes in the manufacturing of shielding, thermal conduction, conductive, sound-absorbing, and new energy materials, providing high-quality component solutions for industries such as telecommunications, automotive, electronics, new energy, and aerospace.

Shenzhen Prite Electronic Technology Co., Ltd. All Rights Reserved. ICP License No. 19141457